Dry Isotropic etching of Silicon using Xenon Di-fluoride for MEMS and other applications

Highly selective Dry Isotropic Etching system using Xenon Di-fluoride (XeF2) for MEMS & other applications

• Low cost xenon difluoride dry isotropic etch system for R & D customers: Xetch e2 series
• Advanced R&D through pilot production xenon difluoride dry isotropic etch system: Xetch X4 series
• CVE Module for high volume production: CVE Module

For more details, please Contact MCube Technologies