Critical Point Drying systems for EM and MEMS Applications

Supercritical point dryer systems for MEMS, Sol-Gel, Carbon Nanotubes, SEM & non clean room applications

MEMS critical point dryer: Anti-stiction solution for MEMS

• Supercritical die and 1” wafer MEMS release tool: AUTOSAMDRI®-815,SERIES B
• Supercritical 4” wafer MEMS release tool: AUTOSAMDRI®-815B, SERIES B
• Supercritical 6” wafer MEMS release tool: AUTOMEGASAMDRI®-915B, SERIES B
• Autosamdri®-934 Touchscreen Series C for 4″ Wafers
• Automegasamdri®-936 Touchscreen Series C for 6″ Wafers
• Automegasamdri®-938 Touchscreen Series C for 8″ Wafers
• New multi-application programmable critical point with LCD touchscreen control: Advanced 931 SAMDRI®

EM Critical point dryer: Solution for Scanning Electron Microscope sample prep & non clean room applications

• Semi-automatic critical point dryer: SAMDRI®-795
• Advanced manual critical point dryer: SAMDRI®-PVT-3D
• The fully automatic critical point dryer: AUTOSAMDRI®-815, SERIES A
• Large capacity fully automatic critical point dryer: AUTOSAMDRI®-815B, SERIES A

For more details, please Contact MCube Technologies